From reducing carbon
emissions to capturing
emitted carbon to use as a
new resource
We have established a research center dedicated to carbon capture in Suwon — in the semiconductor industry — to develop and commercialize carbon capture and utilization technology that stores carbon emitted from semiconductor manufacturing sites and recycles it as a resource.
In September 2021, the Carbon Capture Research Institute (now restructured as "Air Science Research Center") was founded with the aim of developing technology that efficiently collects greenhouse gases with less energy, converting them into useful resources, and promoting cooperative research with domestic and international universities and research institutes.
The company aims to apply carbon capture and expand technology in its semiconductor manufacturing facilities after 2030.
Process gas reduction
technology
DS Division operates gas treatment and processing facilities, assessing gas decomposition characteristics, emissions volume, and overall energy
efficiency. The RCS(Regenerative Catalytic System) mainly treats gases emitted from the etching process in a large-capacity, energy-efficient treatment
facility. We apply a POU(Point Of Use) to each production facility’s emissions during the CVD(Chemical Vapor Deposition) process to reduce emitted
gases.
Reducing particulate
matter to improve
the quality of air
we breathe
We established the Air Science Research Center (previously Particulate Matter Research Institute) in January 2019, dedicated to developing innovative filters and original technologies to detect, analyze, and remove particulate matter.
We successfully developed air purification filter capable of removing both fine particles and gases, which can be easily cleaned with water and reused for up to 20 years. We are piloting a prototype using this technology in air-conditioning facilities like bus terminals, underground parking lots, and DS Division buildings, as well as in test rooms and partner company offices. From 2030, we aim to expand the application of this prototype.
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